11th annual Symposium on Photomask Technology proceedings : September 25-27, 1991, Sunnyvale, California by Symposium on Photomask Technology (11th 1991 Sunnyvale, Calif.)

Cover of: 11th annual Symposium on Photomask Technology | Symposium on Photomask Technology (11th 1991 Sunnyvale, Calif.)

Published by SPIE--the International Society for Optical Engineering in Bellingham, Wash .

Written in English

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  • Integrated circuits -- Masks -- Congresses.,
  • Microlithography -- Congresses.

Edition Notes

Includes bibliographical references and index.

Book details

Other titlesEleventh annual Symposium on Photomask Technology.
Statementsponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.
SeriesSPIE proceedings series ;, v. 1604, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 1604.
ContributionsBACUS (Technical group)
LC ClassificationsTK7874 .S9434 1991
The Physical Object
Paginationvii, 348 p. :
Number of Pages348
ID Numbers
Open LibraryOL1572612M
ISBN 10081940733X
LC Control Number91068116

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